TMH Forms Strategic Partnership Through Investment in Patentix for Next-Generation Power Semiconductor Materials
TMH has formed a strategic partnership with Patentix through an investment to accelerate the practical application of next-generation power semiconductor materials.
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- 📰 Published: April 1, 2026 at 18:00
TMH Co., Ltd. (hereinafter "TMH", Headquarters: Oita City, Oita Prefecture, Representative Director and President: Daisuke Enami) and Patentix Co., Ltd. (hereinafter "Patentix", Headquarters: Kusatsu City, Shiga Prefecture, Representative Director and President: Toyosuke Ebi) are pleased to announce the formation of a strategic partnership through TMH's investment in Patentix, aimed at the practical application of next-generation power semiconductor materials.
With the rapid evolution of AI and the increasing volume of data processing, semiconductors are transforming into the very infrastructure of society. Simultaneously, as power consumption increases, particularly in data centers and mobility sectors, there is growing anticipation for next-generation power semiconductor materials that can significantly enhance power efficiency.
r-GeO₂, which Patentix is researching and developing, is attracting attention as a new material that can address these challenges. Through this partnership, both companies will promote collaboration by leveraging their respective strengths.
Background and Purpose of the Partnership
TMH has supported the stable operation of semiconductor manufacturing sites by advocating for "uninterrupted manufacturing," offering procurement and repair services for semiconductor manufacturing equipment and parts through an EC platform, and selling semiconductor manufacturing equipment utilizing engineering expertise.
The "risk of stoppage" in the semiconductor industry is not limited to operational areas such as equipment and parts. Structural issues arising from upstream technical areas, such as power efficiency and material properties, are also critical factors that determine the sustainability of manufacturing. TMH believes that to achieve "uninterrupted manufacturing" in the medium to long term, involvement in advanced technology areas that support the evolution of manufacturing is crucial, in addition to maintaining the supply chain.
In its medium-to-long-term vision "Vision1000" (a plan targeting 100 billion yen in sales), investment and partnerships in advanced areas are positioned as one of the important strategies for business growth, and this initiative is a concrete step in that direction.
On the other hand, Patentix, a deep tech venture originating from Ritsumeikan University, has been promoting the research and development of r-GeO₂, a next-generation power semiconductor material. To accelerate the practical application of r-GeO₂, practical knowledge of semiconductor manufacturing processes and mass production is indispensable, not just material research. Patentix believes that collaboration with TMH's manufacturing site expertise and supply chain network will advance the social implementation of r-GeO₂.
The alignment of these mutual understandings of challenges and expectations led to the formation of this partnership.
About Patentix's Technology
In the power semiconductor field, research and social implementation of silicon carbide (SiC) and gallium oxide (Ga₂O₃) have been pursued as next-generation materials to replace silicon (Si). While both p-type and n-type conduction have been achieved with SiC, for materials with wider bandgaps such as Ga₂O₃, achieving p-type doping, which is essential for device design, remains a significant challenge.
If both p-type and n-type conduction cannot be achieved, not only is the degree of freedom in circuit design limited, but also the efficiency of power conversion and the miniaturization of devices are constrained.
Rutile-type germanium dioxide (r-GeO₂), which Patentix is researching and developing, is a new material attracting attention as a promising solution to this problem. It has an ultra-wide bandgap of approximately 4.68 eV, comparable to Ga₂O₃, while theoretically allowing for both p-type and n-type conduction. Furthermore, it is said to have higher thermal conductivity and electron mobility than Ga₂O₃, and its overall performance index as a power device (Baliga's figure of merit) shows the potential to surpass existing materials.
Patentix has successfully formed r-GeO₂ thin films using its unique thin-film growth technology "Phantom SVD method," and in 2024, it also succeeded for the first time in the world in demonstrating the operation of a Schottky barrier diode (SBD) using an r-GeO₂ single-crystal thin film, steadily accumulating technical milestones towards practical application.
Roles of Both Companies and Future Outlook
Through this partnership, by connecting TMH's expertise in semiconductor manufacturing sites and its supply chain network with Patentix's advanced material technology, we will accelerate efforts towards the practical application of next-generation power semiconductors.
TMH will leverage its knowledge of parts procurement and equipment operation at semiconductor manufacturing sites, as well as its domestic and international supply chain network, to contribute to practical problem-solving for r-GeO₂ application development and mass production.
Patentix will utilize its specialized knowledge in r-GeO₂ material technology and device design to promote the technological development and social implementation of next-generation power semiconductors.
Both companies will jointly advance problem-solving and application development for the practical application of next-generation materials, and contribute to the sophistication of the entire semiconductor supply chain.
Investment Overview
Patentix Co., Ltd. conducted a third-party allocation of new shares totaling 149,997,600 yen, and TMH subscribed to a portion of it. This investment aims to establish a strategic partnership between the two companies.
Through this investment, both companies will strengthen their collaboration and promote efforts towards the practical application of next-generation power semiconductor materials by leveraging their respective strengths.
Patentix Co., Ltd.
Headquarters: Kusatsu City, Shiga Prefecture
Representative Director and President: Toyosuke Ebi
Established: December 2022 (Venture from Ritsumeikan University)
Business Activities: Research, development, manufacturing, and sales of rutile-type germanium dioxide (r-GeO₂) semiconductor substrates and power devices
TMH Co., Ltd.
Headquarters: Oita City, Oita Prefecture
Representative Director and President: Daisuke Enami
Business Activities: Sales of used semiconductor manufacturing equipment utilizing engineering, and operation of the EC platform "LAYLA-EC" for parts sales and repair services
FAQ
What is the purpose of the partnership between TMH and Patentix?
To accelerate the practical application of r-GeO₂, a next-generation power semiconductor material, aiming to improve power efficiency and ensure sustainable semiconductor manufacturing.
What kind of material is r-GeO₂?
It stands for rutile-type germanium dioxide, a next-generation power semiconductor material with an ultra-wide bandgap, theoretically capable of both p-type and n-type conduction.
What role will TMH play in this partnership?
TMH will leverage its knowledge of semiconductor manufacturing sites and supply chain networks to contribute to application development and practical problem-solving for mass production of r-GeO₂.