Toray Research Center Launches High-Sensitivity Analysis Service for Impurity Nanoparticles in Chemicals, Supporting Expanding Semiconductor Demand in the AI Era
Toray Research Center (TRC) has developed a new technology for highly sensitive analysis of impurity metal nanoparticles in chemicals used in semiconductor manufacturing processes. The company has launched a contract analysis service utilizing this technology, aiming to contribute to improved semiconductor yield and higher purity.
📋 Article Processing Timeline
- 📰 Published: March 30, 2026 at 20:10
- 🔍 Collected: March 30, 2026 at 22:56 (2h 46m after Published)
- 🤖 AI Analyzed: April 22, 2026 at 22:50 (551h 54m after Collected)
## [Summary]
Toray Research Center (Location: 1-7-2 Nihonbashi Honcho, Chuo-ku, Tokyo, President: Yoshiki Makabe, hereinafter "TRC") has developed a technology capable of analyzing the particle concentration and size distribution of impurity metal nanoparticles, which are problematic in semiconductor manufacturing processes, with the highest level of sensitivity in Japan. This was achieved by highly optimizing the sample preparation methods and measurement conditions of single-particle inductively coupled plasma mass spectrometry (spICP-MS*2) using an inductively coupled plasma mass spectrometry (ICP-MS*1) device. Utilizing this technology, TRC is launching a contract analysis service targeting nanoparticles in chemicals for semiconductor manufacturing.
As semiconductor miniaturization progresses, even trace amounts of nanometer*3-sized minute particles (nanoparticles) can cause defects such as disconnections and short circuits. Therefore, purity control of chemicals used in the manufacturing process is becoming increasingly important from the perspective of ensuring yield.
spICP-MS is a high-sensitivity analytical method that can detect individual metal nanoparticles present in liquids and simultaneously measure their size and particle number concentration. TRC has established a unique analytical system that maximizes the features of this method, enabling the detection and quantitative evaluation of trace amounts of impurity nanoparticles contained in chemicals. This service is expected to contribute to further purification of chemicals and improved yield in advanced semiconductor manufacturing.
## [Background]
Amidst the advancement of semiconductor performance and power saving, device miniaturization is accelerating further. On the other hand, contamination by metal nanoparticles is regarded as one of the causes of disconnections and short circuits in integrated circuits. In semiconductor manufacturing processes, various chemicals such as photoresists*4, acids, and organic solvents are used, and the impact of impurity metal nanoparticles contained in these chemicals on device reliability and yield cannot be ignored. Therefore, there has been a strong demand for technology to evaluate trace amounts of metal nanoparticles in chemicals with high sensitivity and quantitatively.
spICP-MS is an analytical method effective for evaluating impurity metal nanoparticles in chemicals, capable of detecting metal nanoparticles dispersed in liquids even at extremely low concentrations of a few ppt*5 (1 part in 10 billion%). However, there were challenges in detecting trace and minute particles due to the influence of noise signals caused by impurities derived from reagents used for sample preparation, metal ions and interfering substances in the sample, and contamination within the measurement device, as well as sensitivity fluctuations due to slight differences in measurement conditions.
## [Technology and Analysis Examples]
To address these challenges, TRC has constructed an analytical system that maximizes the features of spICP-MS by combining the purification of solvents used for sample preparation, operational management to keep the inside of the device clean, and optimization of measurement conditions according to the target chemicals and particles. As a result, it has become possible to detect and quantitatively evaluate extremely trace amounts of metal nanoparticles present in chemicals for semiconductor manufacturing with high sensitivity and stability.
As an example demonstrating the effectiveness of this technology, Figure 1 shows the results of confirming the amount of impurity metal nanoparticles in propylene glycol monomethyl ether acetate (PGMEA*6), which is used as a photoresist solvent and cleaning agent in semiconductor manufacturing processes, using spICP-MS.
When commercially available high-purity PGMEA was measured as is, numerous metal nanoparticles such as aluminum (Al) and iron (Fe) were detected. This result indicates that metal nanoparticles exist as impurities even in chemicals generally considered "high-purity." If sample preparation is performed using this PGMEA, it is difficult to distinguish whether the detected particles originate from the sample or from the PGMEA used for preparation. On the other hand, when similar analysis is performed after purifying this solvent, metal nanoparticles are hardly detected, indicating that using appropriately purified reagents enables more sensitive and reliable impurity evaluation. Notably, the Fe particles detected from the purified PGMEA correspond to a concentration of 0.04 ppt in the solvent, achieving extremely high detection sensitivity.
Furthermore, this method also allows for the evaluation of metal nanoparticles contained in resins by dissolving them in an appropriate solvent, which is effective for estimating contamination sources in chemicals made from solid resins. The analysis of trace amounts of metal nanoparticles in resins became possible only by using highly purified solvents for dissolving the resins. TRC plans to expand the application range to various solvents and materials in the future, responding to an even wider range of analytical needs.
Toray Research Center (Location: 1-7-2 Nihonbashi Honcho, Chuo-ku, Tokyo, President: Yoshiki Makabe, hereinafter "TRC") has developed a technology capable of analyzing the particle concentration and size distribution of impurity metal nanoparticles, which are problematic in semiconductor manufacturing processes, with the highest level of sensitivity in Japan. This was achieved by highly optimizing the sample preparation methods and measurement conditions of single-particle inductively coupled plasma mass spectrometry (spICP-MS*2) using an inductively coupled plasma mass spectrometry (ICP-MS*1) device. Utilizing this technology, TRC is launching a contract analysis service targeting nanoparticles in chemicals for semiconductor manufacturing.
As semiconductor miniaturization progresses, even trace amounts of nanometer*3-sized minute particles (nanoparticles) can cause defects such as disconnections and short circuits. Therefore, purity control of chemicals used in the manufacturing process is becoming increasingly important from the perspective of ensuring yield.
spICP-MS is a high-sensitivity analytical method that can detect individual metal nanoparticles present in liquids and simultaneously measure their size and particle number concentration. TRC has established a unique analytical system that maximizes the features of this method, enabling the detection and quantitative evaluation of trace amounts of impurity nanoparticles contained in chemicals. This service is expected to contribute to further purification of chemicals and improved yield in advanced semiconductor manufacturing.
## [Background]
Amidst the advancement of semiconductor performance and power saving, device miniaturization is accelerating further. On the other hand, contamination by metal nanoparticles is regarded as one of the causes of disconnections and short circuits in integrated circuits. In semiconductor manufacturing processes, various chemicals such as photoresists*4, acids, and organic solvents are used, and the impact of impurity metal nanoparticles contained in these chemicals on device reliability and yield cannot be ignored. Therefore, there has been a strong demand for technology to evaluate trace amounts of metal nanoparticles in chemicals with high sensitivity and quantitatively.
spICP-MS is an analytical method effective for evaluating impurity metal nanoparticles in chemicals, capable of detecting metal nanoparticles dispersed in liquids even at extremely low concentrations of a few ppt*5 (1 part in 10 billion%). However, there were challenges in detecting trace and minute particles due to the influence of noise signals caused by impurities derived from reagents used for sample preparation, metal ions and interfering substances in the sample, and contamination within the measurement device, as well as sensitivity fluctuations due to slight differences in measurement conditions.
## [Technology and Analysis Examples]
To address these challenges, TRC has constructed an analytical system that maximizes the features of spICP-MS by combining the purification of solvents used for sample preparation, operational management to keep the inside of the device clean, and optimization of measurement conditions according to the target chemicals and particles. As a result, it has become possible to detect and quantitatively evaluate extremely trace amounts of metal nanoparticles present in chemicals for semiconductor manufacturing with high sensitivity and stability.
As an example demonstrating the effectiveness of this technology, Figure 1 shows the results of confirming the amount of impurity metal nanoparticles in propylene glycol monomethyl ether acetate (PGMEA*6), which is used as a photoresist solvent and cleaning agent in semiconductor manufacturing processes, using spICP-MS.
When commercially available high-purity PGMEA was measured as is, numerous metal nanoparticles such as aluminum (Al) and iron (Fe) were detected. This result indicates that metal nanoparticles exist as impurities even in chemicals generally considered "high-purity." If sample preparation is performed using this PGMEA, it is difficult to distinguish whether the detected particles originate from the sample or from the PGMEA used for preparation. On the other hand, when similar analysis is performed after purifying this solvent, metal nanoparticles are hardly detected, indicating that using appropriately purified reagents enables more sensitive and reliable impurity evaluation. Notably, the Fe particles detected from the purified PGMEA correspond to a concentration of 0.04 ppt in the solvent, achieving extremely high detection sensitivity.
Furthermore, this method also allows for the evaluation of metal nanoparticles contained in resins by dissolving them in an appropriate solvent, which is effective for estimating contamination sources in chemicals made from solid resins. The analysis of trace amounts of metal nanoparticles in resins became possible only by using highly purified solvents for dissolving the resins. TRC plans to expand the application range to various solvents and materials in the future, responding to an even wider range of analytical needs.