Patentix, a Ritsumeikan University-Spun Startup, Raises Approximately 150 Million Yen in Series A1 (Series A Extension)
Patentix, developing next-generation GeO2 semiconductors, raised 150 million yen in its Series A1 round, bringing total funding to 1.209 billion yen. The funds will accelerate mass production readiness.
📋 Article Processing Timeline
- 📰 Published: April 6, 2026 at 19:00
- 🔍 Collected: April 6, 2026 at 10:30
- 🤖 AI Analyzed: April 21, 2026 at 02:21 (351h 50m after Collected)
Patentix Inc.
April 6, 2026
[Summary]
Patentix Inc. (Headquarters: Kusatsu City, Shiga Prefecture; Representative Director and President: Toyohiro Ibi; hereinafter "Patentix") is a startup spun out of Ritsumeikan University, whose main business is the research, development, and manufacturing of "Germanium Dioxide (GeO2)," an ultra-wide bandgap (UWBG) semiconductor material required for next-generation power devices.
Recently, in the Series A1 (Series A Extension) round, we raised a total of approximately 150 million yen from the following companies and institutions. The total amount raised since our founding in December 2022 has now reached 1.209 billion yen.
[Investors]
Mitsubishi UFJ Capital Co., Ltd., TMH Inc.
*In order of investment amount/Japanese syllabary
[Purpose and Use of Funds]
With this procurement, Patentix will further accelerate its research and development.
[Background and Future Outlook]
With the global spread of EVs (Electric Vehicles) and the rapid increase in AI data centers, improving the efficiency of power consumption has become an urgent issue. Under these circumstances, expectations for ultra-wide bandgap (UWBG) semiconductors that exceed the limits of conventional semiconductors are higher than ever.
In particular, Germanium Dioxide (GeO2) is rapidly attracting attention as the favorite for next-generation power semiconductors because it enables "control of both p-type and n-type"—which is considered difficult with other next-generation materials—and boasts high cost competitiveness.
Since its founding in December 2022, Patentix has steadily accumulated research results during its seed stage, including the confirmation of n-type doping and the operational demonstration of Schottky barrier diodes. With this Series A1 (Series A Extension) funding, our company will make a major shift from the "basic research phase" to the "practical development phase." Moving forward, we will radically strengthen our manufacturing system and accelerate sample shipments, thereby promoting the societal implementation of innovative devices born in Japan, with an eye toward use in harsh environments such as automotive/power infrastructure and even the space industry.
[Comment from the Representative]
I am very pleased to have completed the Series A extension round (Series A1). With this funding, we will further solidify our R&D system and accelerate the development of 6-inch GeO2 semiconductor wafers and GeO2 power devices. The entire team will work together as one to drive innovation, aiming for the earliest possible societal implementation of GeO2 semiconductors.
Toyohiro Ibi, Representative Director, President & CEO, Patentix Inc.
[Comments from Each Investor]
[Mitsubishi UFJ Capital Co., Ltd.]
The next-generation semiconductor material Germanium Dioxide (GeO2) led by Patentix is one of the key technologies contributing to the realization of carbon neutrality and an energy-saving society, holding great potential. Last summer, they succeeded in creating a thin film of rutile-type germanium dioxide (r-GeO2) on a Si substrate, paving the way for providing next-generation semiconductor materials at low cost. We have high expectations for their great development and growth in the future.
[TMH Inc.]
The realization of "unstoppable manufacturing" championed by our company cannot be achieved without collaboration with advanced technologies that evolve manufacturing itself, beyond just the stable supply of equipment and parts. The r-GeO2 being researched and developed by Patentix Inc. is a technology that can solve fundamental issues with power semiconductors. Precisely because our company has supported the frontlines of manufacturing, we strongly believe in the significance of its practical application. Maximizing our frontline knowledge of semiconductor manufacturing and our supply chain network, we will advance the societal implementation of next-generation power semiconductors together with Patentix.
[Company Profile]
Company Name: Patentix Inc.
Establishment: December 1, 2022
Representative: Toyohiro Ibi (Representative Director and President)
Location: 1-1-1 Nojihigashi, Kusatsu City, Shiga Prefecture, Ritsumeikan University BKC
April 6, 2026
[Summary]
Patentix Inc. (Headquarters: Kusatsu City, Shiga Prefecture; Representative Director and President: Toyohiro Ibi; hereinafter "Patentix") is a startup spun out of Ritsumeikan University, whose main business is the research, development, and manufacturing of "Germanium Dioxide (GeO2)," an ultra-wide bandgap (UWBG) semiconductor material required for next-generation power devices.
Recently, in the Series A1 (Series A Extension) round, we raised a total of approximately 150 million yen from the following companies and institutions. The total amount raised since our founding in December 2022 has now reached 1.209 billion yen.
[Investors]
Mitsubishi UFJ Capital Co., Ltd., TMH Inc.
*In order of investment amount/Japanese syllabary
[Purpose and Use of Funds]
With this procurement, Patentix will further accelerate its research and development.
[Background and Future Outlook]
With the global spread of EVs (Electric Vehicles) and the rapid increase in AI data centers, improving the efficiency of power consumption has become an urgent issue. Under these circumstances, expectations for ultra-wide bandgap (UWBG) semiconductors that exceed the limits of conventional semiconductors are higher than ever.
In particular, Germanium Dioxide (GeO2) is rapidly attracting attention as the favorite for next-generation power semiconductors because it enables "control of both p-type and n-type"—which is considered difficult with other next-generation materials—and boasts high cost competitiveness.
Since its founding in December 2022, Patentix has steadily accumulated research results during its seed stage, including the confirmation of n-type doping and the operational demonstration of Schottky barrier diodes. With this Series A1 (Series A Extension) funding, our company will make a major shift from the "basic research phase" to the "practical development phase." Moving forward, we will radically strengthen our manufacturing system and accelerate sample shipments, thereby promoting the societal implementation of innovative devices born in Japan, with an eye toward use in harsh environments such as automotive/power infrastructure and even the space industry.
[Comment from the Representative]
I am very pleased to have completed the Series A extension round (Series A1). With this funding, we will further solidify our R&D system and accelerate the development of 6-inch GeO2 semiconductor wafers and GeO2 power devices. The entire team will work together as one to drive innovation, aiming for the earliest possible societal implementation of GeO2 semiconductors.
Toyohiro Ibi, Representative Director, President & CEO, Patentix Inc.
[Comments from Each Investor]
[Mitsubishi UFJ Capital Co., Ltd.]
The next-generation semiconductor material Germanium Dioxide (GeO2) led by Patentix is one of the key technologies contributing to the realization of carbon neutrality and an energy-saving society, holding great potential. Last summer, they succeeded in creating a thin film of rutile-type germanium dioxide (r-GeO2) on a Si substrate, paving the way for providing next-generation semiconductor materials at low cost. We have high expectations for their great development and growth in the future.
[TMH Inc.]
The realization of "unstoppable manufacturing" championed by our company cannot be achieved without collaboration with advanced technologies that evolve manufacturing itself, beyond just the stable supply of equipment and parts. The r-GeO2 being researched and developed by Patentix Inc. is a technology that can solve fundamental issues with power semiconductors. Precisely because our company has supported the frontlines of manufacturing, we strongly believe in the significance of its practical application. Maximizing our frontline knowledge of semiconductor manufacturing and our supply chain network, we will advance the societal implementation of next-generation power semiconductors together with Patentix.
[Company Profile]
Company Name: Patentix Inc.
Establishment: December 1, 2022
Representative: Toyohiro Ibi (Representative Director and President)
Location: 1-1-1 Nojihigashi, Kusatsu City, Shiga Prefecture, Ritsumeikan University BKC