Announcement of Exhibition at Photomask Japan 2026 Technical Exhibition (32nd Photomask Technology Exhibition)
Key facts
- Announcement of Exhibition at Photomask Japan 2026 Technical Exhibition (32nd Photomask Technology Exhibition)
- NuFlare Technology to exhibit latest drawing and inspection equipment at "Photomask Japan 2026".
- Source: PR Times
- Date: March 30, 2026
Direct answer
NuFlare Technology to exhibit latest drawing and inspection equipment at "Photomask Japan 2026".
- Citation
- Announcement of Exhibition at Photomask Japan 2026 Technical Exhibition (32nd Photomask Technology Exhibition) (March 30, 2026), PR Times
- Source
- PR Times
- Date
- March 30, 2026
NuFlare Technology to exhibit latest drawing and inspection equipment at "Photomask Japan 2026".
📋 Article Processing Timeline
- 📰 Published: March 30, 2026 at 20:53
- 🔍 Collected: March 30, 2026 at 22:56 (2h 2m after Published)
- 🤖 AI Analyzed: April 15, 2026 at 21:58 (383h 2m after Collected)
NuFlare Technology Inc. (NFT) will exhibit at the "Photomask Japan 2026 Technical Exhibition, the 32nd Photomask Technology Exhibition," to be held on April 9th and 10th at Pacifico Yokohama Annex Hall (Yokohama, Kanagawa Prefecture).
This exhibition is held in conjunction with the "Photomask Japan 2026" international symposium on photomask and next-generation lithography mask technologies.
At this exhibition, NFT will introduce the "MBM™-4000," a multi-electron beam mask drawing system that supports mass production of semiconductor manufacturing masks for the A14 node, the "NPI-8000 series," a mask inspection system that achieves high-speed inspection (under 60 minutes) for semiconductor manufacturing masks for 10/7nm to mature nodes through simultaneous transmission and reflection inspection, and the roadmaps for each product.
NFT possesses both the electron beam technology that forms the basis of electron beam mask drawing systems and the optical technology that forms the basis of mask inspection systems. Moving forward, we will continue to drive cutting-edge technology development by leveraging our technological synergy.
Exhibition Period | April 9 (Thu) 10:00–17:00, April 10 (Fri) 10:00–16:00 |
Venue | Pacifico Yokohama Annex Hall Booth No. 31 |
Panel Exhibition | 1. Multi-electron beam mask drawing system: MBM™-4000 |
Related Site
Photomask Japan 2026 | Technical Exhibition (Japanese)
End
FAQ
What is Photomask Japan 2026 Technical Exhibition?
Photomask Japan 2026 Technical Exhibition is an international symposium and exhibition focused on photomask and next-generation lithography mask technologies.
Which company is exhibiting at Photomask Japan 2026?
NuFlare Technology Inc. (NFT) is exhibiting at the event.
What products will NuFlare Technology be showcasing?
NuFlare Technology will showcase the MBM™-4000 (multi-electron beam mask drawing system) and the NPI-8000 series (mask inspection system), along with their product roadmaps.
What are the key features of the MBM™-4000?
The MBM™-4000 is designed to support mass production of semiconductor manufacturing masks for the A14 node.
What are the key features of the NPI-8000 series?
The NPI-8000 series offers high-speed mask inspection (under 60 minutes) for semiconductor manufacturing masks from 10/7nm to mature nodes, using simultaneous transmission and reflection inspection.
When and where is the exhibition taking place?
The exhibition is held on April 9th (10:00–17:00) and 10th (10:00–16:00), 2026, at Pacifico Yokohama Annex Hall, Booth No. 31.
What technological strengths does NuFlare Technology possess?
NuFlare Technology possesses both electron beam technology (for drawing systems) and optical technology (for inspection systems).